EUV pod introduction
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EUV photolithography: resist progress and challenges
EUV photolithography: resist progress and challenges
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spiedigitallibrary.org
What’s the reticle in a lithography system? Find out in this clip. Check out all our EUV systems, and the technology behind them: http://ms.spr.ly/6182wLVGO | ASML
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29 reactions | Our EUV pellicles are 20 times thinner than the membrane of a soap bubble. In our lithography machines, the pellicle prevents particles from contaminating the mask that contains the pattern to be printed on the chip. The pellicle catches the particles and keeps them 'out of focus', while still letting through extreme ultraviolet (EUV) light. | ASML | Facebook
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